| 摘要 |
With a scanning type exposure apparatus of the present invention, information of a target surface for alignment of a sensitive substrate in relation to the direction of an optical axis of a projection system is adjusted in accordance with at least one of a movement mode of a mask and a movement mode of the sensitive substrate, and based on reference information stored in a storage device, and scanning exposure is performed while aligning a surface to be exposed of the sensitive substrate and the target surface. Alternatively, an image formation surface of a pattern image of the mask is adjusted and scanning exposure is performed by aligning the image formation surface of the pattern image of the mask and a surface to be exposed of the sensitive substrate, thus enabling pattern transfer to be performed at a high exposure accuracy.
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