发明名称 |
PRODUCTION OF METAL OXIDE FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a thin film of a crystallized metal oxide which does not require heat treatment at a high temp. and has a relatively large film thickness, for a remarkably short time as compared to the conventional method. SOLUTION: A process for forming a thin film of a metal oxide precursor sol on the surface of a material to be coated by applying the metal oxide precursor sol obtained by using a metallic alkoxide as a main raw material on the surface of the material to be coated and a process for crystallizing the metal oxide gel by irradiating the thin film of the metal oxide gel with ultraviolet ray having <=360 nm wavelength are repeated on the surface of one material to be treated plural times.
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申请公布号 |
JP2000247608(A) |
申请公布日期 |
2000.09.12 |
申请号 |
JP19990050110 |
申请日期 |
1999.02.26 |
申请人 |
KANSAI RESEARCH INSTITUTE |
发明人 |
ASAKUMA NAOKO;TOKI MOTOYUKI;AIZAWA MAMORU |
分类号 |
C01B13/14;C01B13/32;C01G3/00;C01G19/02;C01G23/00;C01G23/047;C01G25/02;C01G30/00;C01G45/00;C23C18/12;C23C20/08;C23C26/00;(IPC1-7):C01B13/14 |
主分类号 |
C01B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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