发明名称 PRODUCTION OF METAL OXIDE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a thin film of a crystallized metal oxide which does not require heat treatment at a high temp. and has a relatively large film thickness, for a remarkably short time as compared to the conventional method. SOLUTION: A process for forming a thin film of a metal oxide precursor sol on the surface of a material to be coated by applying the metal oxide precursor sol obtained by using a metallic alkoxide as a main raw material on the surface of the material to be coated and a process for crystallizing the metal oxide gel by irradiating the thin film of the metal oxide gel with ultraviolet ray having <=360 nm wavelength are repeated on the surface of one material to be treated plural times.
申请公布号 JP2000247608(A) 申请公布日期 2000.09.12
申请号 JP19990050110 申请日期 1999.02.26
申请人 KANSAI RESEARCH INSTITUTE 发明人 ASAKUMA NAOKO;TOKI MOTOYUKI;AIZAWA MAMORU
分类号 C01B13/14;C01B13/32;C01G3/00;C01G19/02;C01G23/00;C01G23/047;C01G25/02;C01G30/00;C01G45/00;C23C18/12;C23C20/08;C23C26/00;(IPC1-7):C01B13/14 主分类号 C01B13/14
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