发明名称 GAS GENERATION SYSTEM
摘要 <p>A gas generator system is provided wherein supply sources (1, 2) for halogenated gases, including pure molecular halogens, are connected into a gas reaction chamber (3), or chamber system, to enable generation of a predetermined gas for localised use in a subsequent process. The reaction chamber has a valved outlet (C) for direct supply of the generated gas to a single or multiple chamber processing tool or process chamber (4). Thus it is possible, for example, to provide for the localised generation of reactive process gases.</p>
申请公布号 WO2000051937(A1) 申请公布日期 2000.09.08
申请号 GB2000000793 申请日期 2000.03.06
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