发明名称 PLASMA REACTOR HAVING A HELICON WAVE HIGH DENSITY PLASMA SOURCE
摘要 A helicon wave, high density RF plasma reactor having improved plasma and contaminant control. The reactor contains a well defined anode electrode that is heated above a polymer condensation temperature to ensure that deposits of material that would otherwise alter the ground plane characteristics do not form on the anode. The reactor also contains a magnetic bucket for axially confining the plasma in the chamber using a plurality of vertically oriented magnetic strips or horizontally oriented magnetic toroids that circumscribe the chamber. The reactor may utilize a temperature control system to maintain a constant temperature on the surface of the chamber.
申请公布号 WO0052973(A2) 申请公布日期 2000.09.08
申请号 WO2000US05797 申请日期 2000.03.06
申请人 APPLIED MATERIALS, INC. 发明人 YIN, GERALD, ZHEYAO;LEE, CHII, GUANG;KHOLODENKO, ARNOLD;LOEWENHARDT, PETER, K.;SHAN, HONGCHING;MA, DIANA, XIAOBING;KATZ, DAN
分类号 C23C16/00;H01J37/32;H05H;H05H1/00;H05H1/24;(IPC1-7):H05H/ 主分类号 C23C16/00
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