| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor growing method and device, with which a vapor growing operation can be repeatedly performed by feeding a gas containing raw material gas to a heated substrate, without contaminating the reaction tube wall counter in parallel with the substrate. SOLUTION: In this vapor growing method, a gas which contains raw gas is introduced to a substrate 2 from an actually parallel gas inlet part 5, the gas, which does not contain raw gas, is introduced from the ventilating microscopic porous member 7 arranged on the wall of the reaction tube 1 counterposing in parallel to the substrate 2, and the contamination on the wall of the reaction tube is prevented.
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