| 摘要 |
PROBLEM TO BE SOLVED: To provide a high precise shadow mask as well as its manufacturing method which produces a shadow mask with excellent repeatability in shape with less side etching by applying an electrolytic etching method in a secondary etching process. SOLUTION: A metal base material 11 has desired resist patterns 12a, 12b formed on the both side thereof and then is subjected to a primary etching (half etching) from the both sides to form a small aperture pattern 15 and a large aperture pattern 16 on the both sides of the metal base material 11. The one face thereof having the small aperture pattern 15 is covered by an etching resistant resin layer 17, while the other face having the large aperture pattern 16 is treated with an electrolytic etching as a secondary etching until the large aperture pattern 16 penetrates the metal base material 11 so as to form a large aperture pattern 16a. The etching resistant resin layer 17 and the resist 12a, 12b are removed to obtain a high precise shadow mask 10.
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