发明名称 APPARATUS FOR RECOGNIZING SURFACE OF EXPOSURE MASK WITH PERICLE
摘要 <p>PROBLEM TO BE SOLVED: To reduce an operator's load and a damage of an exposure mask by supporting a holder detachably mounted with the mask so as to reciprocatingly rotate around a horizontal shaft extended substantially perpendicularly to a vertical shaft provided at an end of a rotary base. SOLUTION: The exposure mask 1 with a pericle 3 is detachably mounted at a holder 15. The holder 15 is reciprocally rotated around a horizontal shaft 18 as indicated by an arrow A in a state such that one surface of the mask 1 is directed upward in a range of a suitable angle to alter an inclination of the mask 1. Further, a turntable 13 is rotated at a suitable angleθaround a vertical shaft 12 for supporting the turntable 13. The holder 15 is reciprocally rotated around the shaft 18 at its rotary position in a range of a suitable angle to alter the mask 1 to another inclination. Thus, since one surface of the mask 1 can be inclined in all directions, an operator's load is alleviated to improve a working efficiency.</p>
申请公布号 JP2000241355(A) 申请公布日期 2000.09.08
申请号 JP19990044327 申请日期 1999.02.23
申请人 ROHM CO LTD 发明人 TOMITA HIROTO
分类号 H01L21/027;G01N21/84;G03F1/84;(IPC1-7):G01N21/84;G03F1/08 主分类号 H01L21/027
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