| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical wave guide element of a high characteristic with a patterned epitaxial oxide thin film optical wave guide, and to provide a manufacturing method capable of conducting precisely patterning for the optical wave guide element with excellent productivity. SOLUTION: In this manufacturing method, an amorphous thin film is formed on a surface of a single-crystal or epitaxial slab oxide optical wave guide 3 to make an epitaxial oxide thin film optical wave guide having a refractive index same to that of the wave guide 3 by heating, then patterning for the amorphous thin film is carried out to form protruded shapes by etching, the patterned amorphous thin film is heated thereafter to be epitaxially grown in a solid state, and the patterned epitaxial oxide thin film optical wave guide having the refractive index the same as that of the slab oxide optical wave guide is formed thereby. |
