A C1F3 gas generation system is provided with supply sources of chlorine (3) (for example a cylinder of compressed chlorine) and fluorine (4) (for example a fluorine generator) connected into a gas reaction chamber (2) enabling generation of C1F3 gas. The reaction chamber has a valved outlet (C) for the supply of the C1F3 gas to a process chamber for immediate local use.
申请公布号
WO0051938(A1)
申请公布日期
2000.09.08
申请号
WO2000GB00796
申请日期
2000.03.06
申请人
SURFACE TECHNOLOGY SYSTEMS LIMITED;BHARDWAJ, JYOTI, KIRON;SHEPHERD, NICHOLAS;LEA, LESLIE, MICHAEL;HODGSON, GRAHAM
发明人
BHARDWAJ, JYOTI, KIRON;SHEPHERD, NICHOLAS;LEA, LESLIE, MICHAEL;HODGSON, GRAHAM