发明名称 CLEANING OF SUBSTRATE FOR LIGHT EMITTING ELEMENT, MANUFACTURE THEREOF, CLEANER FOR SUBSTRATE THEREFOR AND IMPROVEMENT OF SURFACE FLATNESS OF SUBSTRATE THEREFOR
摘要 PROBLEM TO BE SOLVED: To completely remove carbon components attaching to the surface of a substrate for a light emitting element to form a clean surface by removing an oxide film formed by bringing an oxidizing atmosphere having a strong oxidizing power into contact with the surface of the substrate in a reducing atmosphere. SOLUTION: By forming an oxide film 23 on the surface of a ZnSe substrate 21 by bringing an oxidizing atmosphere having a stronger oxidizing power than oxygen into contact with the surface of the ZnSe substrate 21, carbon components attaching to the surface of the substrate are changed into CO2, CO to be removed from the surface. Then, the oxide film 23 is removed by an H2 radical treatment to obtain a clean ZnSe substrate 21. On the clean ZnSe substrate 21, an n-type buffer layer 22, an n-type clad layer 23, an n- or p-type active layer 24, a p-type clad layer 25, and a p-type contact layer 26 are epitaxially grown. Then, an n-type electrode 27 and a p-type electrode 28 are formed on both sides of the substrate to complete a light emitting element. By this method, not only oxygen components but also carbon components attaching to the surface of a substrate for a light emitting element can be removed and thereby the generation of defects of an epitaxial growth film formed on the surface of the substrate for a light emitting element can be prevented.
申请公布号 JP2000244016(A) 申请公布日期 2000.09.08
申请号 JP19990224374 申请日期 1999.07.01
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NAKAMURA TAKAO
分类号 B08B3/08;H01L21/304;H01L33/12;H01L33/28 主分类号 B08B3/08
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