| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for grasping a charged state on a substrate after plasma treatment and when the substrate is raised and separated from an electrode after plasma treatment, by providing a counter electrode with a switch for connecting a charge measuring instrument or a micro current measuring instrument. SOLUTION: A counter electrode 2 opposing an electrode on which a substrate 4 is placed acts as a counter electrode during plasma treatment, while it acts as a measuring probe for measuring a surface potential, etc., of the substrate 4 after the plasma treatment. A switch 7 changes over a connection between the counter electrode 2 and a high frequency power source 5 to a connection between the counter electrode 2 and a charge amount measuring instrument 6 or a micro current measuring instrument. The substrate 4 is exposed to plasma treatment in a chamber 1, and the surface of the substrate 4 is charged after the plasma treatment has been completed, therefore, there exists a potential on the substrate 4 due to the charges. Here, when the switch 7 is change over to the charge amount measuring instrument 6 from the high frequency power source 5, it becomes possible to measure the surface of the substrate 4 because there is the counter electrode 2 connected with the charge amount measuring instrument 6 right above the substrate 4.
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