| 发明名称 |
PLASMA-ASSISTED PROCESSING OF GASEOUS MEDIA |
| 摘要 |
A reactor for the plasma-assisted processing of a gaseous medium, including a pair of electrodes (1, 2) having facing surfaces the separation of which is substantially uniform, with a body (5) of dielectric material positioned between them and defining a plurality of gas passages (6) extending through the space between the electrodes. |
| 申请公布号 |
WO0051714(A1) |
申请公布日期 |
2000.09.08 |
| 申请号 |
WO2000GB00714 |
申请日期 |
2000.02.28 |
| 申请人 |
AEA TECHNOLOGY PLC;INMAN, MICHAEL |
发明人 |
INMAN, MICHAEL |
| 分类号 |
B01D53/32;B01D53/92;B01D53/94;B01J12/00;B01J15/00;B01J19/08;B01J19/24;F01N3/01;F01N3/08;F01N3/28;H05H1/24 |
主分类号 |
B01D53/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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