| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic member which can sufficiently inhibit the dimensional change of semiconductor production equipment due to the change of temperature to improve the dimensional accuracy of semiconductors and can control the generation of damages on silicon wafers and the generation of particles. SOLUTION: The ceramic member for semiconductor production equipment comprises a compact ceramic containing lithium aluminosilicate and calcium silicate as main components or a compact ceramic having a thermal expansion coefficient of -7.0 to 7.0×10-6/ deg.C at a temp. of room temperature to 400 deg.C and a Vickers hardness of 3.0-7.0 GPa. |
