| 摘要 |
PROBLEM TO BE SOLVED: To easily and inexpensively form fine thin films with good dimensional precision. SOLUTION: Masks having through holes are fixed with prescribed intervals from the film forming faces in a substrate, and vapor phase raw material substance is vapor-deposited on the film forming faces through the through holes from plural directions including the directions obliquely crossed with the piercing directions of the through holes, by which thin films of areas wider than those of the through holes are formed. By the thin film forming method, the areas of the screening parts can be increased without widening the intervals among the thin films, so that the thickness of the screening parts can be increased, and the strength thereof can be improved. As a result, the fine through holes can be formed with high dimensional precision, and the thin films can easily and inexpensively be formed.
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