| 发明名称 |
Antireflective composition for a deep ultraviolet photoresist |
| 摘要 |
The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.
|
| 申请公布号 |
US6114085(A) |
申请公布日期 |
2000.09.05 |
| 申请号 |
US19980195057 |
申请日期 |
1998.11.18 |
| 申请人 |
CLARIANT FINANCE (BVI) LIMITED |
发明人 |
PADMANABAN, MUNIRATHNA;DAMMEL, RALPH R.;FICNER, STANLEY A.;OBERLANDER, JOSEPH E.;SAGAN, JOHN P. |
| 分类号 |
G03F7/11;G03F7/09;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
