发明名称 MECHANISM FOR SUPPLYING LIQUID TO WAFER SUCKING PART OF END SURFACE POLISHING DEVICE AND FOR VACUUM SUCKING THE WAFER
摘要 PROBLEM TO BE SOLVED: To prevent the deterioration of a pad at the time of peeling a wafer by selectively communicating a vacuum source and a liquid supply source with a suction hole of a suction board through a tube member with a switching means, and vacuum sucking a wafer placed in the top surface through the pad or jetting the liquid to the wafer. SOLUTION: In the case where a suction hole of a suction board 54 is connected with a vacuum source 128 by a switching valve 127, outside air is sucked through the suction hole of the suction board 54 provided in the upper end of a tube member 125, and a wafer W placed in the top surface through a pad P is sucked. When changeover of connection from the vacuum source 128 to a water supply source 129 is performed by the switching valve 127, water is jetted from the suction hole so as to easily separate the wafer W from the pad P. Further, abrasive grains left in the inner surface of the pad P is flowed out by the water passing through the pad P, and the inside of the pad P is impregnated with the water so as to be maintained in the wet condition, and a change due to dryness is prevented.
申请公布号 JP2000237955(A) 申请公布日期 2000.09.05
申请号 JP19990040235 申请日期 1999.02.18
申请人 SPEEDFAM-IPEC CO LTD 发明人 HAKOMORI SHUNJI
分类号 B24B55/06;B24B9/00;B24B37/00;B24B37/30;H01L21/304;H01L21/68;H01L21/683 主分类号 B24B55/06
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