| 摘要 |
PROBLEM TO BE SOLVED: To reduce the build-up of a coating soln. generated in the vicinity of the outer peripheral portion of an object to be treated and to enhance the uniformity of the film thickness of the coating soln. SOLUTION: The coating apparatus has a thinner supply nozzle 46 capable of being moved on the outer peripheral portion of a glass substrate G held on a substrate suction table and the thinner being a liquid having a viscosity lower than that of a resist soln. is applied to the glass substrate G along the outer peripheral portion thereof. Therefore, if a resist soln. supply nozzle 45 is moved on the glass substrate G in the longitudinal and lateral direction or circumferential direction to supply the resist soln. after the thinner is supplied, the wetting property of the glass substrate G with the resist soln. is enhanced and the contact angle of the resist soln. lowers and, therefore, the build-up of the resist soln. on the outer peripheral portion of the glass substrate G is reduced. |
