| 摘要 |
PURPOSE: An exposing apparatus for manufacturing a semiconductor device is provided to reduce an energy loss of a laser beam and improve a control ability of a coherence and minimize a size of the apparatus. CONSTITUTION: An exposing apparatus for manufacturing a semiconductor device comprises a light source(10) for generating a first laser beam, an optical coherence lowering portion(101) which adapts the first laser beam to have a deferent optical passage and passing time to reduce a coherence, a lens portion(11) for controlling a magnification of the second laser beam to form a third laser beam, a reticle portion(12) for forming a pattern to be transferred through the third laser beam, and a reflecting portion(13) for reflecting the pattern formed by the reticle on a wafer(14). In the apparatus, the optical coherence lowering portion is comprised of a phase deforming circular plate(101a) of which both sides are irregularly deformed and which is formed of a transparent material, and a rotating portion for rotating the phase deforming circular plate at a high speed.
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