发明名称 |
Apparatus for plasma deposition of a thin film onto the interior surface of a container |
摘要 |
A gas inlet, which also serves as a counter electrode, is located inside of a vacuum chamber made of an electrically insulating material. A container is mounted on a mandrel mounted on the gas inlet. The chamber is evacuated to a subatmospheric pressure. A process gas is then introduced into the container through the gas inlet. The process gas is ionized by coupling RF power to a main electrode located adjacent an exterior surface of the chamber and to the gas inlet which deposits a plasma enhanced chemical vapor deposition (PECVD) thin film onto the interior surface of the container.
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申请公布号 |
US6112695(A) |
申请公布日期 |
2000.09.05 |
申请号 |
US19960728283 |
申请日期 |
1996.10.08 |
申请人 |
NANO SCALE SURFACE SYSTEMS, INC. |
发明人 |
FELTS, JOHN T. |
分类号 |
C23C16/04;C23C16/40;H01J37/32;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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