| 摘要 |
PROBLEM TO BE SOLVED: To continuously supply a vapor deposition material to be melted during the evaporation. SOLUTION: Discharge is generated between a cathode 14 of a plasma gun 13 and a hearth 31 in a vacuum container 11 to generate plasma beam PB. The plasma beam PB is guided by the magnetic field to be determined by a permanent magnet 35 in a steering coil 24 and an auxiliary anode 32, and reaches the hearth 31. An evaporation substance stored in a hearth body 33 is heated by the plasma beam and evaporated. The evaporated particles are ionized by the plasma beam, deposited on the surface of a substrate W to which negative voltage is applied, and a film is formed. Since a feed box 70 supplies the evaporation substance in a wire shape through a guide pipe 60, a film forming device can be continuously operated for a long time under a stable condition without opening the vacuum container 11. |
