发明名称 Method of filling an aperture in a substrate
摘要 An aperture in an electronic substrate is filled with a filling material without need for a specially built fill mask. A layer of tape or tentable photosensitive dielectric film is applied to one surface of the substrate covering the aperture. An opening is made in the tape or film by directing radiation through the aperture. Fill material is then forced through the opening to substantially fill the aperture. Protruding nubs may be removed to planarize the substrate surfaces.
申请公布号 US6114098(A) 申请公布日期 2000.09.05
申请号 US19980154935 申请日期 1998.09.17
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 APPELT, BERND KARL;KRESGE, JOHN STEVEN;LAUFFER, JOHN MATTHEW;PAPATHOMAS, KOSTAS I.
分类号 H05K3/00;H05K3/40;(IPC1-7):G03F7/00 主分类号 H05K3/00
代理机构 代理人
主权项
地址