A multipurpose cap layer serves as a bottom anti-reflective coating (BARC) during the formation of a resist mask, a hardmask during subsequent etching processes, a hardened surface during subsequent deposition and planarization processes, and optionally as a diffusion barrier to mobile ions from subsequently deposited materials.
申请公布号
US6114235(A)
申请公布日期
2000.09.05
申请号
US19970924571
申请日期
1997.09.05
申请人
ADVANCED MICRO DEVICES, INC.
发明人
FOOTE, DAVID K.;NGO, MINH VAN;LYONS, CHRISTOPHER F.;WANG, FEI;LEE, RAYMOND T.;EN, WILLIAM G.;CHEN, SUSAN H.;CHAN, DARIN A.