| 摘要 |
An exposure apparatus with detachable illumination sensor, which is used to calibrate permanently installed illumination sensors such as an integrator sensor that detects the intensity of exposing light IL split by a beam splitter inside the illumination system and a fixed-type illumination sensor 7, which is fastened to the surface of the wafer stage 1. The detachable illumination sensor is installed on the wafer stage 1 in a freely detachable manner and the output signal from this detachable illumination sensor is forwarded to an illumination control unit via a sensor control device. In the calibration of the integrator sensor, the intensity of the exposing light IL is synchronously measured by the integrator sensor and the detachable illumination meter and the output signals from these sensors are processed inside the illumination control unit.
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