发明名称 VAPOR CONDENSATION DEVICE, PHOTOSENSITIVE MATERIAL PROCESSING DEVICE AND PHOTOGRAPHIC PROCESSING WASTE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To improve condensation capacity by providing a good heat conductive plate on the Peltier element side of a heat absorbing plate and forming the vapor contact surface of the good heat conductive plate into a hydrophobic surface or the like to enable to make water drops formed on the vapor contact part easily fall down in a vapor condensation device provided with the heat absorbing plate on the heat absorbing surface side of a Peltier element. SOLUTION: This vapor condensation device C used for a photographic processing waste treating device is provided with the Peltier element 10 and the heat absorbing plate 20 provided on the heat absorbing surface 10a side thereof. The heat absorbing plate 20 is provided with the good heat conductive plate 22, on the surface of which many projections 24 are formed. The shape of the projection 24 can be cylindrical, columnar or hemi-circular though being preferably fin like. The surface of the heat absorbing plate 20, that is the vapor contact surface 20a, is made hydrophobic or water repellent and is formed by providing a hydrophobic or water repellent coated layer 26. The coated layer 26 is preferably formed as a coated layer using 'Teflon(R)', vinyl chloride, polyethylene, fluororesin or the like.
申请公布号 JP2000237739(A) 申请公布日期 2000.09.05
申请号 JP19990081033 申请日期 1999.03.25
申请人 FUJI PHOTO FILM CO LTD 发明人 NAKAMURA TAKASHI;HYODO TOMOYOSHI;KUROKAWA TOSHIO
分类号 C02F1/04;G03C5/00;G03D3/00;(IPC1-7):C02F1/04 主分类号 C02F1/04
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