发明名称 RESIST APPLICATION SYSTEM
摘要 PROBLEM TO BE SOLVED: To make formable a fine pattern by using a liquid resist by providing a first coater part wherein the liquid resist is applied to the inner face of a through-hole of a substrate, and a second coater part wherein the liquid resist is applied to the surface of the substrate next to the first coater part. SOLUTION: The first coater part and the second coater part next to the first coater part are provided. The first coater part is equipped with a first resist coat part 3, a runout liquid treating part 4 and a drying part 5. Herein a resist is applied to the inner face of a through-hole, and the resist which is run out and stuck to the surface of a substrate is removed. Pretreatment for the next resist coating is carried out, and the resist liquid applied to the substrate is dried. The second coater part is equipped with a second resist coat part 7, a drying part 8 and a cooling part 9. Herein the resist is applied to the surface of the substrate, the resist is dried and the temperature of the substrate is lowered to ordinary temperature for next treatment of the substrate.
申请公布号 JP2000237665(A) 申请公布日期 2000.09.05
申请号 JP19990043120 申请日期 1999.02.22
申请人 NIPPON AUTO GIKEN KOGYO:KK 发明人 SATO MASAICHI
分类号 H05K3/06;B05C9/06;G03F7/16 主分类号 H05K3/06
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