METHOD FOR FORMING ALIGNMENT KEY OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for forming an alignment key of a semiconductor device is provided to align resist patterns on a same plane with each other, thereby forming a resist pattern in which a three-dimensional effect in a same shot is reduced. CONSTITUTION: A method for forming an alignment key of a semiconductor device comprises steps of coating a resist layer on an upper portion of a semiconductor substrate, firstly exposing the resist layer to light with a first reticle and thus forming an alignment key by a change in a chemical property, secondly exposing the resist layer to the light with a second reticle using the alignment key, and developing the resist layer. In the exposing processes, the resist layer is exposed to the light so that an exposing area with the first reticle is different from an exposing area with the second reticle. The first reticle and the second reticle are formed of a same pattern.