发明名称 Functionally graded metal substrates and process for making same
摘要 The invention provides for a functionally-graded metal substrate that is made of at least two metal compositions, a functional insert and a surrounding body that surrounds the functional insert. In a preferred embodiment of the invention a functional insert powder composition of loose powder metal is placed in a compact of a surrounding body powder composition and both metal compositions are sintered in a sintering furnace to form a sintered part. The sintered part is infiltrated in part or in whole with a molten metal compound to produce a functionally graded metal substrate having a density of at least 90% of theoretical. A heat-generating component such as a chip can be attached to the metal substrate for use in microelectronic packaging. When the functionally-graded metal substrate has two discrete compositions of copper/tungsten the surrounding body which has a CTE that ranges from about 5.6ppm/ DEG C. to about 7 ppm/ DEG C. constrains the expansion of the functional insert which has a thermal conductivity that ranges from about 200 W/mK to about 400 W/mK.
申请公布号 US6114048(A) 申请公布日期 2000.09.05
申请号 US19980148126 申请日期 1998.09.04
申请人 BRUSH WELLMAN, INC. 发明人 JECH, DAVID E.;FRAZIER, JORDAN P.;SWORDEN, RICHARD H.;SEPULVEDA, JUAN L.
分类号 B22F3/26;B22F7/00;B22F7/04;B22F7/06;C22C9/00;C22C27/04;H01L23/12;H01L23/14;H01L23/367;H01L23/373;(IPC1-7):B22F7/00 主分类号 B22F3/26
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