| 摘要 |
PURPOSE: An analysis system of the surface of a printed material is provided to prevent a light source from permeating on the surface of a sample by using the light source having a relatively long wave length. CONSTITUTION: A polarized light filter(13) is under a light source(11) and a sample is laid under the polarized light filter. An enlarger(15) is on the next bed of the polarized light filter at an acute angle with the sample. A CCD camera(15) is on the next bed of the enlarger and connected to a computer. Light emitted from the light source is illuminated on the sample through the polarized light filter. The light reflected on the sample is projected to the CCD camera through the polarized light filter and the enlarger. Thereby, a rate that the light is permeated on the sample is reduced so that the distortion of a phase is greatly decreased.
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