DRYING ETCHING APPARATUS HAVING DOUBLE GAS PLATE

摘要

PURPOSE: A drying etching apparatus is to selectively etch a thin film deposited on a substrate by uniformly flowing a reactive gas on a surface to be etched. CONSTITUTION: An apparatus comprises a chamber(100) having a desired interior space, and the chamber has a substrate outlet(110) to load/unload a substrate. A closing unit(120) is provided on an outer side of the substrate outlet to close the interior of the chamber, and a substrate holder(530) is provided within the chamber to hold the loaded substrate. The substrate holder is engaged to an upper end of a lifting rod(520) and is supported thereby. The chamber has on its lower portion an exhaust pipe(150) connected to a vacuum pump, so that a gas within the chamber is exhausted through the exhaust pipe to make a vacuum within the chamber. The chamber has on its upper portion a cooling gas injecting port(130) to reduce a temperature of the substrate.