发明名称 |
HIGH PERFORMANCE GAAS FIELD EFFECT TRANSISTOR STRUCTURE |
摘要 |
PURPOSE: A high performance arsenic field effect transistor structure is provided to improve a device linearility, reduce a drain current hysterisis and provide a higher gain around MESFET pinch-off voltage. CONSTITUTION: A high performance arsenic field effect transistor structure includes a GaAs substrate(12) having a main surface. A buffer layer(14) is formed on the main surface of the substrate(12), and an active layer(16) and an N cap layer(18) are sequentially formed on the buffer layer(14). A metal source contact(20) is connected to the active layer(16) and the buffer layer(14). A metal drain contact(22) is spatially separated from the metal source contact(20) and is connected only to the active layer(16). A metal gate contact(24) is located between the source and drain contacts(20,22) and forms a Schottky contact along with the active layer.
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申请公布号 |
KR100264963(B1) |
申请公布日期 |
2000.09.01 |
申请号 |
KR19980003657 |
申请日期 |
1998.02.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JONG-BOONG |
分类号 |
H01L29/78;H01L21/338;H01L29/812;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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