| 摘要 |
PURPOSE: A method for manufacturing a liquid crystal display is to uniformly and smoothly carry out the heat radiation from an amorphous silicon layer by forming a source/drain electrode with a low conductive substance. CONSTITUTION: After a transparent conductive layer is formed on an insulating substrate(100), the substrate is etched to form on a pixel a signal line(41L), a source electrode(41S) connected to the signal line, a drain electrode(41D), a pixel electrode(41P) integrally formed with the drain electrode, and the first storage capacitor electrode(41C) defined by a portion of the pixel electrode. An amorphous silicon layer is formed on the entire surface of the substrate in a thickness of 500 to 700 angstrom. After the amorphous silicon layer is executed by a dehydrogenation process, the amorphous silicon layer is crystallized by irradiating a laser onto the layer. The amorphous silicon is etched to form a pixel portion and an active layer.
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