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发明名称
HEAT TREATMENT APPARATUS OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR200191155(Y1)
申请公布日期
2000.09.01
申请号
KR19950007814U
申请日期
1995.04.17
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
MIN, KYUNG- IL;YOON, YONG- KU
分类号
H01L21/324;(IPC1-7):H01L21/324
主分类号
H01L21/324
代理机构
代理人
主权项
地址
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