Thin-film photoelectric conversion device and sputtering- deposition method usable in manufacturing the same

摘要

A sputtering-deposition method usable in forming on an insulator substrate a film including a conductive layer includes the steps of: preparing a conductive substrate holder (1) in the form of a frame having an opening (1a) at its central area and electrically grounded; positioning the insulator substrate (2) to cover the opening (1a) of the holder (1); arranging a flexible spacer (5) on a peripheral edge of the substrate (2) and also superposing a back plate (3) on the spacer (5) to press the substrate (2) against the holder (1) via the spacer (5); pressing and fixing the back plate (3) to the holder (1); and then sputtering a separately provided target to deposit a new layer on a region of the substrate (2) exposed in the holder's opening (1a).