发明名称 ELECTRON BEAM DEVICE AND IMAGE FORMING DEVICE
摘要 <p>An electron beam device having an airtight container, an electron source provided in the container and a spacer (1), characterized in that the spacer (1) has at least an area (4) where a fine particle-containing layer exists, a sheet resistance of the spacer as measured on the surface of the area is 107 Φ/&lt; or higher, and the fine particles have an average grain size of up to 1000Å and contain at least metal elements. The electron beam device delivers an excellent display quality minimized in luminous point displacement and in creeping discharge, and an extended reliability.</p>
申请公布号 WO2000051158(P1) 申请公布日期 2000.08.31
申请号 JP2000001047 申请日期 2000.02.24
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