发明名称 Verfahren und Vorrichtung zum Behandeln von Substraten
摘要 For the uniform coating of a substrate (13) the invention provides for a device and a method for coating substrates by which the substrate is supported on a substrate holder (5) in such a way that a substrate surface (15) to be coated is bare and the substrate is turned with the substrate holder. The method and device are characterized in that a cover (20) can be fixed to the substrate holder and together with said substrate holder forms a closed chamber for the substrate.
申请公布号 DE19906398(A1) 申请公布日期 2000.08.31
申请号 DE19991006398 申请日期 1999.02.16
申请人 STEAG HAMATECH AG 发明人 DRES, PETER;KRAUS, PETER;APPICH, KARL;SZEKERESCH, JAKOB;WEIHING, ROBERT
分类号 B05D1/40;B05C11/08;B05D3/10;G03F7/16;H01L21/00;H01L21/027;(IPC1-7):B05C11/08 主分类号 B05D1/40
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