发明名称 |
Verfahren und Vorrichtung zum Behandeln von Substraten |
摘要 |
For the uniform coating of a substrate (13) the invention provides for a device and a method for coating substrates by which the substrate is supported on a substrate holder (5) in such a way that a substrate surface (15) to be coated is bare and the substrate is turned with the substrate holder. The method and device are characterized in that a cover (20) can be fixed to the substrate holder and together with said substrate holder forms a closed chamber for the substrate.
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申请公布号 |
DE19906398(A1) |
申请公布日期 |
2000.08.31 |
申请号 |
DE19991006398 |
申请日期 |
1999.02.16 |
申请人 |
STEAG HAMATECH AG |
发明人 |
DRES, PETER;KRAUS, PETER;APPICH, KARL;SZEKERESCH, JAKOB;WEIHING, ROBERT |
分类号 |
B05D1/40;B05C11/08;B05D3/10;G03F7/16;H01L21/00;H01L21/027;(IPC1-7):B05C11/08 |
主分类号 |
B05D1/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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