| 发明名称 |
Röntgenstrahlenabsorber in einer Röntgenstrahlenmaske und Verfahren zur Herstellung desselben |
| 摘要 |
X-ray absorber in an X-ray mask and a method for manufacturing the same which includes a first layer of crystalline phase formed on a predetermined portion of the surface of a membrane and a second layer of amorphous phase formed on the first layer. |
| 申请公布号 |
DE19747775(C2) |
申请公布日期 |
2000.08.31 |
| 申请号 |
DE1997147775 |
申请日期 |
1997.10.29 |
| 申请人 |
LG SEMICON CO., LTD. |
发明人 |
LEE, DON-HEE;PARK, CHIL-KEUN;SONG, KI-CHANG;JEON, YOUNG-SAM;LEE, JEONG SOO |
| 分类号 |
G03F1/22;G21K1/10;H01L21/027 |
主分类号 |
G03F1/22 |
| 代理机构 |
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代理人 |
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| 地址 |
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