| 摘要 |
The invention relates to a method and arrangement in growing of plants, in which a continuous substrate (1, 2, 3) to be placed on an underlaying (A) is used, the substrate (1, 2, 3) being substantially parallel (arrow X) to the underlaying (A) and comprising at least a cultivation layer (1a, 2a, 3a) for growing of plants (K). In the invention, at least two substantially parallel substrates (1, 2, 3) are placed on the underlaying (A), wherein at least one substrate (1, 2, 3) also comprises a supporting layer (1b, 2b, 3b) holding the cultivation layer (1a, 2a, 3a) together and bordering its cross section (P1, P2) at least partly, the plant (K) is planted in the first substrate (1, 2, 3), and the first substrate (1, 2, 3) and the second substrate (1, 2, 3) are arranged in a contact which enables the growing of the roots of the plant (K) from one substrate (1, 2, 3) to another to control the growth of the plant (K) as well as its supply of nutrients. |
