| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a new method and a new apparatus which are used to measure the surface characteristic of a bipolar electrostatic chuck. SOLUTION: A wafer 2 which comprises an opening part 7 and which is composed of a conductive material is placed on the attraction face 1A of this bipolar electrostatic chuck 1. A probe drive means 4 is driven downward. A probe 3 is brought into contact with the attraction face 1A via the opening part 7. After that, a prescribed voltage is applied to the bipolar electrostatic chuck 1 from an external power supply 9. The wafer 2 and the probe 3 are attracted to the attraction face 1A. After a prescribed time elapses, the probe 3 is pulled upward by the probe drive means 4. An applied load at a time when the probe 3 is separated from the attraction face 1A is detected by a load measuring device 5. Thereby, the attractive force of the bipolar electrostatic chcuk is measured.</p> |
