| 摘要 |
PROBLEM TO BE SOLVED: To provide an objective lens for projection being suitable for short- wavelength lithography. SOLUTION: This objective lens for projection is used for the short- wavelength microlithography whose wavelength is preferably <=100 nm. Besides, it is provided with six mirrors, that means, the 1st mirror S1 to the 6th mirror S6 arranged so that numerical aperture(NA) at an image side becomes NA >=0.15. Then, the 5th mirror S5 arranged at a position being nearest to a wafer surface 4 is arranged so as to be separated at a prescribed distance from the wafer surface.
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