| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photomask blank which does not cause accumulation of charges on the blank coated with a resist when a pattern is drawn with electron beams using a high acceleration voltage electron beam drawing machine, and to provide a photomask with excellent pattern position accuracy. SOLUTION: The blank 20 having an additional film forming region 22 where a transparent electrically conductive thin film is additionally formed by sputtering or vapor deposition in the region where no film is formed of the photomask blank by using a substrate holder 10 for additional film forming is formed. Further, a pattern is drawn with electron beams by using a high acceleration voltage electron beam drawing machine, and then treated for patterning such as by developing to produce a photomask.</p> |
