发明名称 |
Method and apparatus for modifying surface material |
摘要 |
A method and an apparatus for modifying a surface layer formed on the surface of a base material in order to modify the characteristics of the surface layer such as to control the chemical composition of the surface layer and to develop a novel utilization of ultra-pure water. The method includes the step of contacting a surface layer on a base material with ultra-pure water in an oxygen-free atmosphere. The amount of dissolved oxygen in the water is preferably 1 ppm or below, and the ultra-pure water is preferably boiled. The apparatus includes a chamber having inert gas introduction means for introducing an inert gas thereinto, and inert gas discharge means for discharging the inert gas therefrom, a container disposed inside the chamber for holding ultra-pure water, and heating means disposed in the chamber for heating ultra-pure water held in the ultra-pure water container.
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申请公布号 |
US6110534(A) |
申请公布日期 |
2000.08.29 |
申请号 |
US19970901341 |
申请日期 |
1997.07.28 |
申请人 |
OHMI, TADAHIRO |
发明人 |
OHMI, TADAHIRO;NAKAGAWA, YOSHINORI |
分类号 |
C23C8/02;C23C8/80;C23C22/34;C23C22/83;(IPC1-7):B05D3/02 |
主分类号 |
C23C8/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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