发明名称 Triple well structure
摘要 A triple well structure for an embedded dynamic random access memory uses an ion implantation performed on a portion of the first conductive type substrate between a second conductive type source and a second conductive type deep well. A first conductive type block region is formed between the second conductive type source and the second conductive type deep well.
申请公布号 US6111283(A) 申请公布日期 2000.08.29
申请号 US19990241524 申请日期 1999.02.01
申请人 UNITED SEMICONDUCTOR CORP. 发明人 YANG, JOHNNY;HUANG, HSIU-WEN
分类号 H01L21/8234;H01L21/8242;H01L27/108;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L21/8234
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