Coating apparatus for semiconductor process

摘要

A coating apparatus for coating an LCD substrate with a developing liquid for a photo-resist has a conveyer mechanism for linearly conveying the substrate in a conveying direction. The conveyer mechanism has a plurality of lower conveyer rollers which are driving rollers, and a plurality of upper conveyer rollers which are driven rollers. A main support roller is arranged such that it replaces one of the lower conveyer rollers. A developing liquid supply nozzle is arranged above the main support roller for supplying a developing liquid onto the substrate when the substrate is passing over the main support roller. The supply nozzle has a supply port which is laterally long and narrow, so that the developing liquid is supplied onto the substrate from the supply nozzle as a band. This band extends over the entire width of a target region of the substrate, which is perpendicular to the conveying direction, and is supplied thereto all at once.