发明名称 Process and apparatus for producing polycrystalline semiconductor
摘要 A process and apparatus for producing a high-quality polycrystalline semiconductor ingot with excellent crystallographic properties are disclosed. The interior of an airtight vessel is kept in an inert atmosphere for semiconductors. A raw semiconductor material is charged in a crucible, and the raw semiconductor material is heated by an induction heating coil so as to be melted. Then the bottom of the crucible is deprived of heat for causing the raw semiconductor material to solidify, thereby producing a polycrystalline semiconductor. The semiconductor crystal grows in one direction from the bottom to the top of the crucible while the heat emission is changed in accordance with a predetermined relationship for keeping the solidification rate of the raw semiconductor material constant.
申请公布号 US6110274(A) 申请公布日期 2000.08.29
申请号 US19980108371 申请日期 1998.07.01
申请人 SHARP KABUSHIKI KAISHA 发明人 OKUNO, TETSUHIRO
分类号 C01B33/02;C01B33/037;C30B11/00;C30B21/02;C30B28/06;C30B29/06;H01L21/208;H01L31/04;(IPC1-7):C30B13/20 主分类号 C01B33/02
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