发明名称 METHOD FOR PATTERNING LOW-MELTING-POINT GLASS AND FILM FOR SANDBLASTING USED IN THE METHOD
摘要 PROBLEM TO BE SOLVED: To pattern an electrode, a partition or the like, by efficiently using a low-m.p. glass and to easily remove a resist. SOLUTION: A film formed on a substrate with an inorg. paste 12 consisting essentially of a binder resin having combustion decomposability free of inorg. material and a residue is patterned by sandblasting, a low-m.p. glass 10 or an electrode material contg. low-m.p. glass is filled in the formed recess, a sandblast-resistant resist mask 14 is released, the low-m.p. glass is fired, and the inorg. powder is removed in this method.
申请公布号 JP2000233948(A) 申请公布日期 2000.08.29
申请号 JP19990034758 申请日期 1999.02.12
申请人 FUJI SEISAKUSHO:KK 发明人 MASE KEIJI;KANDA SHINJI
分类号 B24C1/04;C03C17/23;C03C19/00;H01J9/02;H01J11/22;H01J11/34;H01J11/36;(IPC1-7):C03C19/00;H01J11/02 主分类号 B24C1/04
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