发明名称 |
Electron gun and electron beam exposure device |
摘要 |
An electron gun includes a plate-like main cathode 77 having an electron emitting surface 79 and a sub-cathode 81 provided toward the rear surface of the main cathode to heat the main cathode 77 by imparting an electron bombardment. The sub-cathode 81 is constituted of filaments 83 and 85 coiled in a double helix structure and the diameter of the sub-cathode 81 is larger than the diameter of the main cathode 77. As a result, the temperature at the peripheral area of the electron emitting surface 79 can be set higher than the temperature at the center, to achieve an electron beam with a uniform intensity distribution. |
申请公布号 |
AU2327600(A) |
申请公布日期 |
2000.08.29 |
申请号 |
AU20000023276 |
申请日期 |
2000.02.08 |
申请人 |
NIKON CORPORATION |
发明人 |
MAMORU NAKASUJI;KAZUYA OKAMOTO |
分类号 |
H01L21/027;H01J3/02;H01J37/075 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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