发明名称 Electron gun and electron beam exposure device
摘要 An electron gun includes a plate-like main cathode 77 having an electron emitting surface 79 and a sub-cathode 81 provided toward the rear surface of the main cathode to heat the main cathode 77 by imparting an electron bombardment. The sub-cathode 81 is constituted of filaments 83 and 85 coiled in a double helix structure and the diameter of the sub-cathode 81 is larger than the diameter of the main cathode 77. As a result, the temperature at the peripheral area of the electron emitting surface 79 can be set higher than the temperature at the center, to achieve an electron beam with a uniform intensity distribution.
申请公布号 AU2327600(A) 申请公布日期 2000.08.29
申请号 AU20000023276 申请日期 2000.02.08
申请人 NIKON CORPORATION 发明人 MAMORU NAKASUJI;KAZUYA OKAMOTO
分类号 H01L21/027;H01J3/02;H01J37/075 主分类号 H01L21/027
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