| 摘要 |
PROBLEM TO BE SOLVED: To make polish machining allowance uniform and increase the polishing speed by rotatably holding a glass disc in the vertical attitude, and providing a pair of rotating polishing units whose axis of rotation is parallel to the axis of rotation of the glass disc, and which are positioned on the outside of the outer periphery of the disc and have a specified diameter. SOLUTION: A both-side polishing apparatus 50 holds a disc 1 to be polished rotatably in the vertical attitude by a holding means 4 provided on a frame 5. A pair of rotating polishing units 2a, 2b clamping both the surface and the back of the disc 1 to be polished respectively have a diameter D, which satisfies the expression D>D1-D2 to the outside diameter D1 of the disc 1 to be polished and the inside diameter D2, the axis of rotation thereof is parallel to the axis of rotation, and they are disposed on the outside of the outer periphery. At least one of the rotating polishing units 2a, 2b is moved in the lateral direction by an abut means to press the disc 1 to be polished with the rotating polishing units 2a, 2b, and a polishing liquid is supplied to the disc to be polished. |
