发明名称 VACUUM ARC EVAPORATION SOURCE AND DEPOSITION APPARATUS
摘要 PURPOSE: A vacuum arc evaporation source and a vacuum arc vapor deposition apparatus provided with the vacuum arc evaporation source are provided. CONSTITUTION: To provide an evaporation source and an arc evaporation apparatus in which an evaporation material as a cathode of arc discharge, and a magnetic field generating source arranged so that all lines of magnetic force crossing the evaporation surface of the evaporation material cross substantially vertically are arranged whereby the number of molten particles arriving at a substrate by the magnetic field can be reduced, and deviation of occurrence of arc spots can be suppressed.
申请公布号 KR20000053411(A) 申请公布日期 2000.08.25
申请号 KR20000000591 申请日期 2000.01.07
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO 发明人 TAKAHARA KAZUKI;FUJII HIROFUMI
分类号 C23C14/35;H01J37/32;(IPC1-7):C23C14/35 主分类号 C23C14/35
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