METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFER

摘要

PURPOSE: A method and apparatus for cleaning a semiconductor wafer are provided which makes an optimum cleaning of a semiconductor wafer with a minimum consumption of a cleaning solution. CONSTITUTION: An apparatus for cleaning a semiconductor wafer(18) cleans the wafer with a cleaning solution, and comprises a cleaning room(1) having a plurality of roller pairs where the cleaning solution are supplied. Each roller pair is constituted by an upper roller(8) and a lower roller(9), and the semiconductor wafer is transported between the roller pairs. The apparatus also comprises a conveyor apparatus(2) transporting the wafer. The apparatus comprises a liquid film(17) which is supplied by the conveyor apparatus and which transports the semiconductor wafer, and the apparatus supplies the cleaning solution to the upper roller.