发明名称 SUBSTRATE-TREATING DEVICE
摘要 PURPOSE: A fluid-suction device is provided to remove fluid which remains on a substrate and a substrate carrier underneath. CONSTITUTION: A support element(2,3) having suction pipes(6,7) and a container(1) are lifted above a fluid cover(11). At this time, a substrate carrier(4) is got dry but treatment fluid remains on legs(11, 12) underneath of the substrate carrier(4). To remove the remained treatment fluid, the substrate carrier(4) and a substrate(5) are sucked through the suction pipes(6,7). Consequently, the substrate carrier(4) may be got dry simply and fast.
申请公布号 KR20000052877(A) 申请公布日期 2000.08.25
申请号 KR19997003728 申请日期 1999.04.28
申请人 STEAG MICROTECH GMBH 发明人 FINGERHOLZ AURELIA;SCHOENLEBER DIETMAR
分类号 B08B3/04;H01L21/00;H01L21/304;(IPC1-7):H01L21/00 主分类号 B08B3/04
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